FEI Nova NanoSEM 450

Allows user to achieve high imaging resolution at a range of kV
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Description

The NanoSEM 450 is a field-emission scanning electron microscope (FE-SEM), which attains ultra-high imaging resolution without the specimen size restrictions of a conventional in-lens FE-SEM due to the advanced design of the electron optics. The NanoSEM 450’s Schottky field-emission source allows the user to achieve high imaging resolution at a range of kV, at both low (high-resolution imaging) and high (microanalytical imaging) currents. Secondary electron (SE) imaging can be undertaken in both field-free and immersion mode for comprehensive low-to-high resolution imaging of a variety of samples. The NanoSEM 450 is fitted with a retractable annular backscattered electron detector as well as an Oxford silicon drift detector– energy dispersive X-ray spectroscopy SDD-EDS system for the convenient visualisation of compositional differences across the specimen surface.

Specifications

    • Schottky field-emission electron gun 50V-30kV operating voltage
    • 1nm at 15kV, 1.4nm at 1kV
    • 2nm at 15kV
    • In lens secondary election detector
    • Everhart–Thornley secondary electron detector  
    • Annular backscattered electron detector
    • 170 mm2 Oxford X-ray energy dispersive spectroscopy (EDS)
    • SEM pin stub holder
    • Cross section holder  
    • Wafer holder

Publishing Microscopy Data Acquired on the FEI Nova NanoSEM 450

      • Chemical fixation, dehydration, critical point drying
      • Mounting in resin
      • Staining
      • Polishing
      • Mounting on stub with adhesive
      • Coating
      • Manufacturer: FEI 
      • Model: Nova NanoSEM 450 
      • Type: Schottky FEG
      • Accelerating voltage (kV)
      • Detector(s) used for imaging (SE, BSE, EBSD, SDD-EDX)
      • Detector: Oxford X-Max 20mm2 EDS detector 
      • Software: Oxford AZtec 
      • Accelerating voltage (kV) 
      • For quantitative analysis: matrix correction used, calibration method used (standardless or specify standards), elements calculated via difference or stoichiometry, excluded elements, accuracy of elemental values as shown by measurement of standard(s) of known composition
      • Adjustments to contrast/brightness
      • EDS map filters applied

      • Scalebars can be added or removed from images in the export options.

    Acknowledgement:

    “The authors acknowledge the facilities and the scientific and technical assistance of Microscopy Australia at the Electron Microscope Unit (EMU) within the Mark Wainwright Analytical Centre (MWAC) at UNSW Sydney.”

    Credit EMU staff: Feel free to mention EMU staff who have assisted you with your work! If staff have been involved with your work beyond basic training and support (e.g., project design, complex data/image processing, independent imaging/analysis, manuscript preparation), it may be appropriate to discuss co-authorship with the relevant staff and your supervisor.

    Don’t forget to email the EMU lab manager with a copy of your publication to claim 2 hours of free microscopy time.

Applications

  • Materials Science
  • Life sciences
  • Biomaterials
  • Solar and battery materials
  • Earth Sciences
  • Medical Sciences

Capabilities

  • Secondary electron imaging 
  • Backscatter imaging 
  • Energy dispersive X-ray analysis (EDX) 
  • Cathodoluminescence (CL)

Instrument location

Electron Microscope Unit

B68, Basement
June Griffith Building (F10)
UNSW Sydney, NSW 2033

Access – To discuss training or how your project could benefit from using this microscope, please contact the EMU using the enquiries form or  email EMUAdmin@unsw.edu.au

Dr Karen Privat

Research Associate (SEM-based Imaging & Microanalysis)
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    Email
    k.privat@unsw.edu.au

Dr Simon Hager

Industry Applications Scientist
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    s.hager@unsw.edu.au

Dr Yin Yao

Technical Officer
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    yin.yao@unsw.edu.au

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