Shimadzu, Kratos Axis Supra+ 

Description

X-ray photoelectron spectroscopy (XPS), also known as Electron Spectroscopy for Chemical Analysis (ESCA), is a technique for analysing the surface chemistry of a material. XPS can measure the elemental composition, chemical state and electronic state of the elements within a material. The technique enables identification and quantification of all surface elements (except hydrogen). XPS analysis can be utilised to characterize the layer structure of thin films with sputter depth profiling where elements are quantified as a function of depth. Virtually all vacuum-compatible solid materials including fibres and powder and any species deposited onto a solid surface can be analysed by XPS. Minimal sample preparation is required.

Ultraviolet photoelectron spectroscopy (UPS) is conducted on the XPS instrument using a helium ultraviolet lamp to eject low energy photoelectrons from the valence orbital of a material. A UPS spectrum provides information on the Highest Occupied Molecular Orbital (HOMO) and Density of States (DOS) from the valence band and allows determination of the surface photoelectric work-function of a material.

• All elements in the periodic table except H and He can be semi-quantified by XPS - detection limit is 0.1-0.2 atomic percent.
• Sampling depth of approximately 1-10 nm.
• Minibeam 6-Gas Cluster Ion Source (GCIS) for depth profile.
• High power X-ray, dual Al Kα/Ag Lα monochromator.
• Variable-temperature stage.
• He UV Source for ultraviolet photoelectron spectroscopy (UPS).
• Parallel XPS imaging (1 mm ultimate spatial resolution)
• The preferred sample dimensions for our XPS instrument are length/width < 10mm and height of 1mm (maximum height 5mm).