IONTOF ToFSIMS5
Time-of-flight mass spectrometer for chemical surface analysis, imaging and depth profiling
Description
The TOFSIMS5 is a time-of-flight secondary ion mass spectrometer for molecular and elemental surface analysis using a bismuth cluster analysis beam.
This instrument is instrument is used for depth profiling of flat, multilayer samples with high-depth resolution. We can couple imaging and depth profiling experiments to produce 3-dimensional images of changes in chemistry below the surface of a material.
Specifications
- Elemental and isotopic imaging down to 100 nm lateral resolution, and Angstrom-resolution depth profiling (caesium, oxygen and argon-cluster ion beams) is also available from this instrument.
- Surface chemical analysis (<2 nm) for both positive and negative elemental, isotopic and molecular analytes at high mass resolution.Surface chemical imaging, potentially down to 100 nm resolution.
Applications
- Semiconductors
- Manufactured components
- Polymers
- Geology
Instrument location
Surface Analysis Laboratory
Room G63
June Griffith Building (F10)
UNSW Sydney, NSW 2033
Email: surfacelab@unsw.edu.au
Songyan Yin
Senior Technical Officer
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Email
songyan.yin@unsw.edu.au
Bin Gong
Senior Technical Officer
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Email
b.gong@unsw.edu.au
